End of lithography at 32 nm?, *| LoFi version for PDAs |
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End of lithography at 32 nm?, *| Guest |
Posted: Feb 21 2006, 07:43 AM
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Apparently unanswered question today: http://www.eetimes.com/news/semi/showArtic...cleID=180204904
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| guiding_light |
Posted: Jun 19 2006, 03:34 AM
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Advanced Member  Group: Members Posts: 628 Joined: 29-July 05 Positive Feedback: 58.33% Feedback Score: 4 |
Largest dose to size in literature is 36.8 mJ/cm^2. That's 25 photons/nm^2. 125 nm photoresist thickness. Apply the exponential attenuation. You see the picture. |
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| mfp in Cu |
Posted: Jul 17 2006, 12:38 PM
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The mean free path of an electron with Fermi energy of 7 eV in copper is ~39 nm.
http://hyperphysics.phy-astr.gsu.edu/hbase.../ohmmic.html#c2 What does that mean? It seems awfully a long distance (expecting a few nm or so). |
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| guiding_light |
Posted: Jul 18 2006, 02:49 PM
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Advanced Member Group: Members Posts: 628 Joined: 29-July 05 Positive Feedback: 58.33% Feedback Score: 4 |
The related links at that site give additional info. The mean free path is long because there is very little electron scattering into states close to the Fermi level. The electric field probably gives micro-eV energy difference. This is already smaller than thermal excitation (~0.026 eV at room temperature). Impact ionization (which generates secondary electrons from primary ones) involves energy differences at least on the order of the Fermi energy, so for metals, the mean free path is small, but for insulators, where the density of states is much less, the mean free path is also large (observed to be > 10-20 nm). |
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| guiding_light |
Posted: Jul 19 2006, 01:03 AM
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Advanced Member Group: Members Posts: 628 Joined: 29-July 05 Positive Feedback: 58.33% Feedback Score: 4 |
McCord and Pease, JVST B vol. 6, p. 293-296 (1988).
Apparently 20 eV electrons from an STM can go through 20 nm PMMA. |
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| guiding_light |
Posted: Jul 19 2006, 05:24 AM
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Advanced Member Group: Members Posts: 628 Joined: 29-July 05 Positive Feedback: 58.33% Feedback Score: 4 |
http://www.cs.vu.nl/~nsilvis/microeng.pdf
Figure 3 shows spread of secondary-electron driven contamination growth. 20 nm spread at the surface is already visible. |
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| eh |
Posted: Jul 20 2006, 06:23 AM
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http://scitation.aip.org/getabs/servlet/Ge...=cvips&gifs=Yes
More data from X-ray exposure on gold substrate. The electrons seemed to move 50 nm from the resist-substrate interface into the resist. These are mostly the secondary electrons (<10 eV) which have longest mean free path as well. |
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| Neil Farbstein |
 Posted: Jul 30 2006, 05:51 AM
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Advanced Member Group: Members Posts: 1174 Joined: 25-October 05 Positive Feedback: 41.03% Feedback Score: -62 |
You dont want a really powerful computer that can design an engine that never knocks or breaks down. If you hit the wall you're going to get hurt John. -------------------- Life is a tale told by an idiot full of sound and fury; signifying nothing...Tomorrow and tomorrow and tomorrow, but tomorrow never comes. -William Shakespeare.
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| fivedoughnut |
 Posted: Jul 30 2006, 06:25 AM
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Member of the "forum mafia" Group: Members Posts: 1667 Joined: 13-November 05 Positive Feedback: 57.14% Feedback Score: 32 |
Has anyone thought of going 3-D?......We now have the technology for 3-D printing why not apply it to processors?...although cooling these buggers will need a little imagination.
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| 3D is here |
Posted: Jul 31 2006, 01:40 PM
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3D technology already being used through chip stacking. Maybe it's a cheat but definitely more transistors per unit area.
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| not the end I hope |
Posted: Aug 5 2006, 03:58 PM
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| guiding_light |
Posted: Aug 9 2006, 01:19 AM
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Advanced Member Group: Members Posts: 628 Joined: 29-July 05 Positive Feedback: 58.33% Feedback Score: 4 |
Obviously ASML wants to score as much revenue as possible from this tool. |
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| guiding_light |
Posted: Nov 30 2007, 02:40 PM
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Advanced Member Group: Members Posts: 628 Joined: 29-July 05 Positive Feedback: 58.33% Feedback Score: 4 |
game over.
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